Lecture
Initiated chemical vapor deposition (iCVD) is a solvent-free, cost efficient technique to synthesize highly conformal organic thin films from the vapor phase. The underlying free radical polymerization can be specifically tuned by the deposition parameters and enables furthermore copolymerization from various comonomer feed. This enables a wide field of applications like surface functionalisation, functional dielectrics and devices. We demonstrate the tailored synthesis of fluoropolymers as well as organosilicon polymers and their application for conformal coatings on delicate substrates with complex 3d geometries, superior functional electret layers for sensor applications or energy harvesting and adhesion promotion by use of different monomers within one iCVD process.
