Development of zirconium and hafnium oxide based thin films by pulsed laser deposition.Tuesday (18.06.2019) 20:15 - 20:16
Zirconium and hafnium oxide based ceramics are of great interest in many fields of research areas. They are attractive for high temperature applications and it is possible to use them at locations where harsh environmental conditions prevail. In this work, thin film samples with various compositions in the multicomponent system x(ZryHf1-y)O2 + (x-1)YTaO4 are fabricated by pulsed laser deposition. It focuses on the preparation and analysis of these films ablated from different sintered single targets with a variety in composition. In this context the influence of the substrate material and target composition as well as the process parameters like deposition temperature, target-to-substrate distance, pulse rate and oxygen process pressure are discussed. Besides conventional X-ray diffraction (XRD) characterization, film thickness, morphology and film quality are investigated by scanning electron microscopy (SEM). The results show a great dependence of the film properties on the substrate temperature and the amount of oxygen gas used during the deposition process. By modifying the concentration of the elements or by controlling the process parameter, it is possible to tailor the lattice structure and to receive a mainly martensitic or austenitic phase.
The funding by a Reinhart Koselleck project of the German Research Foundation (DFG) is gratefully acknowledged.